Dry Film Photoresist Ultra Developer Concentrate

Dry Film Photoresist Developer Ultra concentrate solution designed to work with our range of Negative working Dry Film Photo resist and Dry Film Solder mask products.   This is a Potassium carbonate based developer that can be used in developing trays, immerse developing tanks or for optimal resolution a spray Developing processor machine should be used. Bath make up for Photo imageable aqueous resists should be 1.8% – 2.6% depending on the type of dry film used. Working Conditions Optimum Exposure time prior to developing should be determined with a 21 Step Stouffer Step Wedge Temperature                        28-38 Degrees Celcius pH Working Solution         Discard when pH falls below 10.5 in accordance with local water authority regulations Resist Loading                    Typical resist loading will be between 3-4 mil/ft2 per litre   1 Litre Developer Concentrate makes approximately a 45 Litre working solution 5 Litre Developer concentrate makes approximately a 225 Litre working solution